Tungsten filament quartz lamp

Fri, 26 Jun 2026 05:00:26 +0800

On the fab floor, your photoresist thermal budget is what keeps line width honest. If the soft bake profile starts drifting, resist thickness goes all over the place, and your critical dimension control falls apart before you even hit the etch. We built our tungsten filament quartz lamps to take that variability off the table—steady, repeatable heat exactly where the process needs it. What actually matters under the hood Inside the lamp, a tungsten filament sits in a high-purity quartz envelope, giving you clean, controllable infrared output. Across the bake surface, you get wafer-level thermal uniformity within ±0.1°C. That translates straight into consistent solvent removal during soft bake, and predictable crosslinking during hard bake. The system sits comfortably in Class 1–100 cleanrooms and runs without creating particle events, so defect counts stay where you want them. It holds up 24/7 with no unplanned downtime, and the output stays stable over 5,000+ hours—less than 5% intensity drift. Why this matters in lithography In lithography, the bake step sets the resist profile before exposure and etch. With this lamp, the setpoint holds tight: soft bake removes solvents uniformly, and hard bake locks the resist geometry without over- or under-cure. That repeatability cuts scrap, speeds up qualification, and keeps the etch stack within spec. Energy use stays sensible too—fast thermal response and minimal standby losses lower operating cost without slowing throughput. The practical details you’ll want to plan for The lamp works with standard tool interfaces, but the thermal profile still depends on chamber design. Plan a short commissioning run to map the hot zones and tune the reflector geometry for your wafer size. There’s a bit of warm-up before setpoint stability, and periodic calibration checks will keep that ±0.1°C uniformity over years of operation.

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Tungsten filament quartz lamp