Photoresist soft bake temperature IR

Mon, 08 Jun 2026 05:05:57 +0800

On the lithography floor, a soft bake that drifts even 2°C throws the photoresist thermal budget off. Solvent retention climbs. CD uniformity takes a hit. That difference is the line between a good lot and scrap. We built our infrared soft bake module to take that variability off the table. What matters technically The IR emitter uses short-wave quartz, heating the wafer surface directly—no contact. Temperature control holds ±0.1°C across the wafer, and repeatability stays within ±0.2°C lot-to-lot. The profile is quick: 15 seconds to stabilization, so you cut bake time without overshoot. Cleanroom Class 1–100 is supported by a particle-controlled design that keeps generation below 0.1 particle/cm². You get a lot of thermal output for the energy draw, and the module fits standard track footprints with 24/7 reliability. Why it works where you run it You run mixed nodes and thin resists, and soft bake sets the stage for exposure latitude and defect performance. Tight thermal uniformity cuts footing and scum, improving critical dimension control and reducing rework. The fast ramp shortens cycle time and keeps throughput steady during lot changes. Fewer bake-related excursions mean less time chasing parameters and more time shipping good wafers. Things to know Installation is straightforward on most tracks, but the IR path needs line-of-sight and a clean quartz window. Any film or residue scatters energy and skews the profile. The module also needs a stable power supply and cooling that matches the cleanroom HVAC envelope. Expect a short commissioning run to lock in the setpoint for your resist stack. Once that’s done, the process stays in control.

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Photoresist soft bake temperature IR